Pattern asymmetries in phase-edge imaging

Michael Fritze; Susan G. Cann; Peter W. Wyatt

doi:10.1117/12.354369

26 July 1999 Pattern asymmetries in phase-edge imaging

Michael Fritze, Susan G. Cann, Peter W. Wyatt

Proceedings Volume 3679, Optical Microlithography XII; (1999) https://doi.org/10.1117/12.354369
Event: Microlithography '99, 1999, Santa Clara, CA, United States

Abstract

Strong phase-shift methods such as alternating aperture and chromeless edge are resolution-enhancement techniques that promise to extend optical lithography to the 100-nm regime and possibly below.

Citation Download Citation

Michael Fritze, Susan G. Cann, and Peter W. Wyatt "Pattern asymmetries in phase-edge imaging", Proc. SPIE 3679, Optical Microlithography XII, (26 July 1999); https://doi.org/10.1117/12.354369

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