Performance of a phase-shift focus monitor reticle designed for 193-nm use

Roderick R. Kunz; M. S. Chan; Scott P. Doran

doi:10.1117/12.354298

26 July 1999 Performance of a phase-shift focus monitor reticle designed for 193-nm use

Roderick R. Kunz, M. S. Chan, Scott P. Doran

Proceedings Volume 3679, Optical Microlithography XII; (1999) https://doi.org/10.1117/12.354298
Event: Microlithography '99, 1999, Santa Clara, CA, United States

Abstract

A phase-shift focus monitor reticle designed for 193-nm was characterized on a 0.5-NA 193-nm projection lens. Calibration data were obtained and compared to simulations of the specific lens used. Using a thinned single-layer resist, feature sizes of 150 nm, and a partial coherence of 0.6, a calibration coefficient of roughly 50 nm of image shift per 1 micrometers of defocus was obtained. This relationship was linear through roughly 1.5 micrometers of focus. Once this calibration was determined, the reticle was successfully used to quantify thermal effects resulting from laser- induced heating of the lens. The latter results will only be qualitatively described here.

Citation Download Citation

Roderick R. Kunz, M. S. Chan, and Scott P. Doran "Performance of a phase-shift focus monitor reticle designed for 193-nm use", Proc. SPIE 3679, Optical Microlithography XII, (26 July 1999); https://doi.org/10.1117/12.354298

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