Synergistic evolution to production-worthy 30-nm lithography

Daniel R. Cote; James A. McClay; Noreen Harned

doi:10.1117/12.354325

26 July 1999 Synergistic evolution to production-worthy 30-nm lithography

Daniel R. Cote, James A. McClay, Noreen Harned

Proceedings Volume 3679, Optical Microlithography XII; (1999) https://doi.org/10.1117/12.354325
Event: Microlithography '99, 1999, Santa Clara, CA, United States

Abstract

The ever-increasing demand on circuit performance necessitates rapid deployment of optical lithographic as well as early production next generation lithographic tools. Successful execution of the multitude of development programs involved requires careful consideration and implementation of system architecture with special emphasis on program synergy and modularity. This paper presents performance data and system budgeting and allocation for current generation lithographic tools, and building from that basis, discusses evolutionary approaches for critical performance areas and modules. Supporting analytical results regarding performance of these modules are also discussed.

Citation Download Citation

Daniel R. Cote, James A. McClay, and Noreen Harned "Synergistic evolution to production-worthy 30-nm lithography", Proc. SPIE 3679, Optical Microlithography XII, (26 July 1999); https://doi.org/10.1117/12.354325

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available