Simulation and optimization of holographically exposed photoresist gratings

Ch. Zanke; Andreas Gombert; Andreas Erdmann; M. Weiss

doi:10.1117/12.346788

29 April 1999 Simulation and optimization of holographically exposed photoresist gratings

Ch. Zanke, Andreas Gombert, Andreas Erdmann, M. Weiss

Proceedings Volume 3729, Selected Papers from International Conference on Optics and Optoelectronics '98; (1999) https://doi.org/10.1117/12.346788
Event: Selected Papers from the International Conference on Optics and Optoelectronics, 1998, Dehradun, India

Abstract

Standard approaches of lithographic process simulation have been applied to the simulation of holographically exposed photoresist gratings. Fine tuning of the photoresist development parameters results in a good agreement of simulated and experimentally obtained photoresist profiles. Several conclusions with respect to the optimization of process and photoresist parameters for the fabrication of user defined photoresist profiles are drawn.

Citation Download Citation

Ch. Zanke, Andreas Gombert, Andreas Erdmann, and M. Weiss "Simulation and optimization of holographically exposed photoresist gratings", Proc. SPIE 3729, Selected Papers from International Conference on Optics and Optoelectronics '98, (29 April 1999); https://doi.org/10.1117/12.346788

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