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15 March 1999Theory of single-pulse laser amorphization of semiconductors
The theory of amorphization under pulsed laser melting of surfaces of crystalline semiconductors, based on mechanism of point defect capture and formation of nanometer periodic defect-deformational structures, is developed. The critical defect concentration and critical solidification front velocity at exceeding of which amorphization occurs are determined. The hierarchy of structural transformations at surface after melt solidification observed with decrease of laser fluency is analytically described.
Vladimir I. Emel'yanov andIvan M. Panin
"Theory of single-pulse laser amorphization of semiconductors", Proc. SPIE 3734, ICONO '98: Fundamental Aspects of Laser-Matter Interaction and New Nonlinear Optical Materials and Physics of Low-Dimensional Structures, (15 March 1999); https://doi.org/10.1117/12.342363
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Vladimir I. Emel'yanov, Ivan M. Panin, "Theory of single-pulse laser amorphization of semiconductors," Proc. SPIE 3734, ICONO '98: Fundamental Aspects of Laser-Matter Interaction and New Nonlinear Optical Materials and Physics of Low-Dimensional Structures, (15 March 1999); https://doi.org/10.1117/12.342363