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7 September 1999 Design and fabrication of miniaturized dielectric interference coatings
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Miniaturized interference filters were designed and fabricated using three different manufacturing technologies. Applying micro-milled ceramic masks during the coating processes different arrays of interference filters with 1 mm lateral feature size were arranged on a 3-inch Si-substrate. The spectral sensitivity of receiver cells has been modified by direct coating using ion assisted deposition (IAD) at low temperature. IAD-processes also allow the application of microlithographic masks, which are removable by organic solvents after the deposition process. As an example three different miniaturized interference filters were arranged side by side with lateral filter dimensions of a few tens of microns. A combination of coating processes, microlithographic masking procedures, and reactive ion etching made it possible to arrange three different stripe filters with minimum filter features of about 5 micrometers side by side.
© (1999) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Marcus Frank, Norbert Kaiser, and Uwe B. Schallenberg "Design and fabrication of miniaturized dielectric interference coatings", Proc. SPIE 3738, Advances in Optical Interference Coatings, (7 September 1999);

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