Laser damage testing of SiO2 and HfO2 thin films

M. Di Giulio; Marco Alvisi; Maria Rita Perrone; Maria Lucia Protopapa; Antonio Valentini; Lorenzo Vasanelli

doi:10.1117/12.360097

7 September 1999 Laser damage testing of SiO₂ and HfO₂ thin films

M. Di Giulio, Marco Alvisi, Maria Rita Perrone, Maria Lucia Protopapa, Antonio Valentini, Lorenzo Vasanelli

Proceedings Volume 3738, Advances in Optical Interference Coatings; (1999) https://doi.org/10.1117/12.360097
Event: Optical Systems Design and Production, 1999, Berlin, Germany

Abstract

SiO₂ and HfO₂ thin films have been deposited on polished fused silica substrates by the ion assisted electron beam evaporation technique in different deposition conditions. The role of the assisting ion beam parameters either on the otpical and structural film properties and the film damage threshold at 308 nm has been investigated. Laser damage thresholds have been determined by the photoacoustic mirage technique.

Citation Download Citation

M. Di Giulio, Marco Alvisi, Maria Rita Perrone, Maria Lucia Protopapa, Antonio Valentini, and Lorenzo Vasanelli "Laser damage testing of SiO₂ and HfO₂ thin films", Proc. SPIE 3738, Advances in Optical Interference Coatings, (7 September 1999); https://doi.org/10.1117/12.360097

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