Light scattering and atomic force microscopic investigations on magnetron sputtered oxide single layers and multilayers for micromechanical laser mirrors

Hartmut Kupfer; Frank Richter; Peter Schlott; Angela Duparre; Stefan Gliech

doi:10.1117/12.360106

7 September 1999 Light scattering and atomic force microscopic investigations on magnetron sputtered oxide single layers and multilayers for micromechanical laser mirrors

Hartmut Kupfer, Frank Richter, Peter Schlott, Angela Duparre, Stefan Gliech

Author Affiliations +

Proceedings Volume 3738, Advances in Optical Interference Coatings; (1999) https://doi.org/10.1117/12.360106
Event: Optical Systems Design and Production, 1999, Berlin, Germany

Abstract

Oxide single layers of niobium oxide and silicon dioxide with different film thicknesses and multilayers consisting of this both components were deposited by reactive sputtering on silicon substrates. The loss of optical performance by structural imperfections was characterized measuring the total light scattering in comparison to AFM roughness investigations. The measured scattered light and the rms roughness values calculated from the AFM images were found to correlated clearly with the density of macroscopic defects in the Nb₂O₅ and SiO₂ single layers. With multilayers, similar effects were observed.

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Hartmut Kupfer, Frank Richter, Peter Schlott, Angela Duparre, and Stefan Gliech "Light scattering and atomic force microscopic investigations on magnetron sputtered oxide single layers and multilayers for micromechanical laser mirrors", Proc. SPIE 3738, Advances in Optical Interference Coatings, (7 September 1999); https://doi.org/10.1117/12.360106

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