Oxide films made by radio frequency sputtering of solid and powder targets: a comparison

A. V. Krasilnikova; Enrico Masetti; Francesca Varsano; Elvira Maria Bauer

doi:10.1117/12.360116

7 September 1999 Oxide films made by radio frequency sputtering of solid and powder targets: a comparison

A. V. Krasilnikova, Enrico Masetti, Francesca Varsano, Elvira Maria Bauer

Proceedings Volume 3738, Advances in Optical Interference Coatings; (1999) https://doi.org/10.1117/12.360116
Event: Optical Systems Design and Production, 1999, Berlin, Germany

Abstract

Cathode sputtering is a well-known technique for deposition of thin films starting from metallic or ceramic materials. Ceramic insulating materials are usually sputtered using radio frequency as electric power source. In this work we compare the optical properties of tin films deposited from two different types of targets. The first set of samples was deposited from solid targets glued to a water-cooled back- plate. For the second set we used targets made of cold pressed powders of the corresponding materials. The possibility of sputtering from weakly pressed powders can be favorably exploited to develop mixed materials. Their cost, in fact, is about one tenth of glued solid targets, and mixtures of any required composition can be quickly prepared. Two oxides, SiO₂ and Al₂O₃ have been deposited by both methods in the same deposition chamber, using the same process parameters, and sputtering gas. Their optical characteristics - refractive index and extinction coefficient - have been compared over the VIS-NIR spectral range.

Citation Download Citation

A. V. Krasilnikova, Enrico Masetti, Francesca Varsano, and Elvira Maria Bauer "Oxide films made by radio frequency sputtering of solid and powder targets: a comparison", Proc. SPIE 3738, Advances in Optical Interference Coatings, (7 September 1999); https://doi.org/10.1117/12.360116

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KEYWORDS

Refractive index

Sputter deposition

Oxides

Solids

Thin films

Absorption

Thin film deposition

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