Sensitivity of the ellipsometric angles psi and delta to the surface inhomogeneity

Alexander V. Tikhonravov; Michael K. Trubetskov; Enrico Masetti; A. V. Krasilnikova; I. V. Kochikov

doi:10.1117/12.360078

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7 September 1999 Sensitivity of the ellipsometric angles psi and delta to the surface inhomogeneity

Alexander V. Tikhonravov, Michael K. Trubetskov, Enrico Masetti, A. V. Krasilnikova, I. V. Kochikov

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Proceedings Volume 3738, Advances in Optical Interference Coatings; (1999) https://doi.org/10.1117/12.360078
Event: Optical Systems Design and Production, 1999, Berlin, Germany

Abstract

Recently a new approximation for the ellipsometer angles of a slightly inhomogeneous thin film was developed. This approximation enables performing a more detailed qualitative analysis of ellipsometric angles than the widely used approximation assuming the linear bulk inhomogeneity. In particular, the new approximation describes not only the impact of inhomogeneity on the ellipsometric angle (Psi) but also its impact on the ellipsometer angle (Delta) . This paper reports specific properties of ellipsometric spectra connected with the surface micro-roughness. In the particular case of fluoride films the ellipsometric angle (Delta) turns to be quite sensitive to this type of inhomogeneity if ellipsometric measurements are performed at high angles of incidence.

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Alexander V. Tikhonravov, Michael K. Trubetskov, Enrico Masetti, A. V. Krasilnikova, and I. V. Kochikov "Sensitivity of the ellipsometric angles psi and delta to the surface inhomogeneity", Proc. SPIE 3738, Advances in Optical Interference Coatings, (7 September 1999); https://doi.org/10.1117/12.360078

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