UV coatings produced with plasma-ion-assisted deposition

Rainer Goetzelmann; Harro Hagedorn; Alfons Zoeller

doi:10.1117/12.360126

7 September 1999 UV coatings produced with plasma-ion-assisted deposition

Rainer Goetzelmann, Harro Hagedorn, Alfons Zoeller

Proceedings Volume 3738, Advances in Optical Interference Coatings; (1999) https://doi.org/10.1117/12.360126
Event: Optical Systems Design and Production, 1999, Berlin, Germany

Abstract

Plasma-IAD with the APS has been applied for a large number of different layer systems in production an ind R and D. The ability for the production of shift free multilayer coatings for the visible and NIR spectral range is utilized in manufacture for many applications such as steep edge filters for color separation, rugate filters for laser protection and narrow-bandpass filters for wavelength division multiplexing. An overview was given. Shift free narrowband filters for the UV-B region were published in 1996. The paper reports the result of UV coatings using plasma ion assisted deposition. Tantala/silica and hafnia/silica combinations have been used for multilayer coatings in the UV-A and UV-B spectral range. Single layers of silica and alumina and multilayer systems with both materials were investigated in the UV-B and UV-C region. The coatings were characterized by obtained transmittance and reflectance curves as well as absorption and scattering measurements. The temperature stability results are compared with coatings in the visible and NIR spectral range published.

Citation Download Citation

Rainer Goetzelmann, Harro Hagedorn, and Alfons Zoeller "UV coatings produced with plasma-ion-assisted deposition", Proc. SPIE 3738, Advances in Optical Interference Coatings, (7 September 1999); https://doi.org/10.1117/12.360126

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