Enhanced microlithography using coherent multiple imaging

Miklos Erdelyi; Karoly Osvay; Zsolt Bor; William L. Wilson Jr.; Michael C. Smayling; Frank K. Tittel

doi:10.1117/12.346891

28 April 1999 Enhanced microlithography using coherent multiple imaging

Miklos Erdelyi, Karoly Osvay, Zsolt Bor, William L. Wilson Jr., Michael C. Smayling, Frank K. Tittel

Proceedings Volume 3741, Lithography for Semiconductor Manufacturing; (1999) https://doi.org/10.1117/12.346891
Event: Microelectronic Manufacturing Technologies, 1999, Edinburgh, United Kingdom

Abstract

An experimental and theoretical study of a coherent multiple imaging technique that utilizes a Fabry-Perot etalon placed between the photo mask and the projection lens is reported. This technique can enhance both resolution and depth of focus in optical microlithography. A lithography simulation tool, Prolith/2 was used to evaluate the aerial image profile using a complex phase-amplitude pupil-plane filter to simulate the effect of the Fabry-Perot etalon. This work specifically discusses the evaluation of extended periodic patterns, widely used in lithographic simulations. Simulation results are described and compared with experimental data. The impact of Talbot images generated by periodic structures is also described.

Citation Download Citation

Miklos Erdelyi, Karoly Osvay, Zsolt Bor, William L. Wilson Jr., Michael C. Smayling, and Frank K. Tittel "Enhanced microlithography using coherent multiple imaging", Proc. SPIE 3741, Lithography for Semiconductor Manufacturing, (28 April 1999); https://doi.org/10.1117/12.346891

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