Electron beam column for in-line applications featuring enhanced imaging of high-aspect-ratio structures by selective detection of on-axis secondary electrons

Harry Munack; Walter Koegler; Holger Baumgarten; Christian Ruebekohl; Pavel Adamec; Ralf Degenhardt; Hans Peter Feuerbaum; Dieter Winkler

doi:10.1117/12.346937

27 April 1999 Electron beam column for in-line applications featuring enhanced imaging of high-aspect-ratio structures by selective detection of on-axis secondary electrons

Harry Munack, Walter Koegler, Holger Baumgarten, Christian Ruebekohl, Pavel Adamec, Ralf Degenhardt, Hans Peter Feuerbaum, Dieter Winkler

Author Affiliations +

Proceedings Volume 3743, In-Line Characterization, Yield Reliability, and Failure Analyses in Microelectronic Manufacturing; (1999) https://doi.org/10.1117/12.346937
Event: Microelectronic Manufacturing Technologies, 1999, Edinburgh, United Kingdom

Abstract

The scanning electron microscope presented here allows for enhanced and selective detection of on-axis secondary electrons by a novel two-detector arrangement in combination with a beam separator. It is based on our high-resolution electron beam column. The off-axis secondary electrons are recorded by a conventional in-lens detector. The on-axis secondary electrons from the primary electrons and deflects them towards a scintillator-based detector. The detector for on-axis secondary electrons can either work in a stand-alone mode or in combination with the in-lens detector. Due to the symmetry of its deflection field, the beam separator causes no first-order chromatic aberrations to the primary beam and the spatial resolution is not deteriorated. A first experimental evaluation has demonstrated the enhanced capabilities of this system.

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Harry Munack, Walter Koegler, Holger Baumgarten, Christian Ruebekohl, Pavel Adamec, Ralf Degenhardt, Hans Peter Feuerbaum, and Dieter Winkler "Electron beam column for in-line applications featuring enhanced imaging of high-aspect-ratio structures by selective detection of on-axis secondary electrons", Proc. SPIE 3743, In-Line Characterization, Yield Reliability, and Failure Analyses in Microelectronic Manufacturing, (27 April 1999); https://doi.org/10.1117/12.346937

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