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25 August 1999 Advanced electron-beam writing system EX-11 for next-generation mask fabrication
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Proceedings Volume 3748, Photomask and X-Ray Mask Technology VI; (1999) https://doi.org/10.1117/12.360219
Event: Photomask and X-Ray Mask Technology VI, 1999, Yokohama, Japan
Abstract
Toshiba and Toshiba Machine have developed an advanced electron beam writing system EX-11 for next-generation mask fabrication. EX-11 is a 50 kV variable-shaped beam lithography system for manufacturing 4x masks for 0.15 - 0.18 micrometer technology generation. Many breakthroughs were studied and applied to EX-11 to meet future mask-fabrication requirements, such as critical dimension and positioning accuracy. We have verified the accuracy required for 0.15 - 0.18 micrometer generation.
© (1999) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
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