New approach for realizing k1=0.3 optical lithography

Masanobu Hasegawa; Akiyoshi Suzuki; Kenji Saito; Minoru Yoshii

doi:10.1117/12.360235

25 August 1999 New approach for realizing k₁=0.3 optical lithography

Masanobu Hasegawa, Akiyoshi Suzuki, Kenji Saito, Minoru Yoshii

Author Affiliations +

Proceedings Volume 3748, Photomask and X-Ray Mask Technology VI; (1999) https://doi.org/10.1117/12.360235
Event: Photomask and X-Ray Mask Technology VI, 1999, Yokohama, Japan

Abstract

A new exposure technology called IDEAL (Innovative Double Exposure by Advanced Lithography) which realizes k1 equals 0.3 optical lithography is introduced. In IDEAL exposure method, rough pattern mask and fine pattern mask are used. The rough pattern mask contributes to expand the degree of freedom in two-dimensional patterning and the fine pattern mask contributes to higher resolution and focus DOF enhancement. As an actual example, 120 nm gate array is formed using KrF 0.63 NA stepper. It has been confirmed that the double exposure method is effective in the pattern formation of irregularly arranged contact hole arrays of 150 nm. Furthermore, it is also shown that double exposure method is effective in the reduction of mask error enhancement factors (MEF).

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Masanobu Hasegawa, Akiyoshi Suzuki, Kenji Saito, and Minoru Yoshii "New approach for realizing k₁=0.3 optical lithography", Proc. SPIE 3748, Photomask and X-Ray Mask Technology VI, (25 August 1999); https://doi.org/10.1117/12.360235

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