New mask blank handling system for the advanced electron-beam writer EX-11

Shusuke Yoshitake; Kenji Ooki; Yoji Ogawa; Katsuhito Ogura; Teruaki Yamamoto; Ryoichi Hirano; Masaki Toriumi; Toru Tojo

doi:10.1117/12.360222

25 August 1999 New mask blank handling system for the advanced electron-beam writer EX-11

Shusuke Yoshitake, Kenji Ooki, Yoji Ogawa, Katsuhito Ogura, Teruaki Yamamoto, Ryoichi Hirano, Masaki Toriumi, Toru Tojo

Author Affiliations +

Proceedings Volume 3748, Photomask and X-Ray Mask Technology VI; (1999) https://doi.org/10.1117/12.360222
Event: Photomask and X-Ray Mask Technology VI, 1999, Yokohama, Japan

Abstract

Meeting the latest requirements of aggressive users for advanced masks for optical lithography will be difficult. In addition, improving the productivity and throughput of advanced masks with high-density pattern data is necessary. To overcome these hurdles, Toshiba and Toshiba Machine have developed a new advanced mask writer, the EX-11, shown in Figure 1. The EX-11 takes measures against airborne contamination before drawing is started. It also employs a standard mechanical interface (SMIF) based on the concept of local cleaning technology. This paper describes the design concept of the new mask blank handling system for the EX-11, and the efficiency of these measures was confirmed by the experimental results.

Citation Download Citation

Shusuke Yoshitake, Kenji Ooki, Yoji Ogawa, Katsuhito Ogura, Teruaki Yamamoto, Ryoichi Hirano, Masaki Toriumi, and Toru Tojo "New mask blank handling system for the advanced electron-beam writer EX-11", Proc. SPIE 3748, Photomask and X-Ray Mask Technology VI, (25 August 1999); https://doi.org/10.1117/12.360222

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