Properties of sputtered TaGe as an x-ray absorber material

Takuya Yoshihara; S. Kotsuji; Katsumi Suzuki

doi:10.1117/12.360225

25 August 1999 Properties of sputtered TaGe as an x-ray absorber material

Takuya Yoshihara, S. Kotsuji, Katsumi Suzuki

Author Affiliations +

Proceedings Volume 3748, Photomask and X-Ray Mask Technology VI; (1999) https://doi.org/10.1117/12.360225
Event: Photomask and X-Ray Mask Technology VI, 1999, Yokohama, Japan

Abstract

Various Ta-based amorphous alloys are used as x-ray absorber materials due to their good stress controllability and stability. TaGe and TaReGe are especially suitable because of their high x-ray absorption coefficient. However, While TaGe films are more easily patterned by dry-etching than TaReGe films, their stress is more difficult to control. To improve the stress control in TaGe films, we investigated the stress under various deposition conditions. We found we could control the stress of TaGe to an adequate compressive stress with high repeatability by adjusting the DC power and working gas pressure. The stress characteristics of Ta₉Ge and Ta₄Ge were similar, but the stress uniformity of Ta₄Ge was better than that of Ta₉Ge by about 5 MPa. We could easily reduce the stress by annealing, which simultaneously improved the stress uniformity.

Citation Download Citation

Takuya Yoshihara, S. Kotsuji, and Katsumi Suzuki "Properties of sputtered TaGe as an x-ray absorber material", Proc. SPIE 3748, Photomask and X-Ray Mask Technology VI, (25 August 1999); https://doi.org/10.1117/12.360225

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