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19 July 1999 Phase mask for high focal depth
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Proceedings Volume 3749, 18th Congress of the International Commission for Optics; (1999) https://doi.org/10.1117/12.355052
Event: ICO XVIII 18th Congress of the International Commission for Optics, 1999, San Francisco, CA, United States
Abstract
We present a phase mask that substantially reduces the influence of focus error of an optical system; while preserving light gathering power, and lateral resolution. Numerical simulations and first experimental results are shown.
© (1999) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Jorge Ojeda-Castaneda, Albertina Castro, and Javier Santamaria "Phase mask for high focal depth", Proc. SPIE 3749, 18th Congress of the International Commission for Optics, (19 July 1999); https://doi.org/10.1117/12.355052
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