Paper
25 October 1999 Relative variation of stress-optic coefficient with wavelength in fused silica and calcium fluoride
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Abstract
Birefringence in refractive components such as lenses has become an increasingly serious problem in semiconductor lithography as exposure wavelength decreases. Most measurements of birefringence are made with visible light but the light used for photolithography is in the UV and deep UV spectral regions. Measurements of the relative variation of stress-optic constants have been made for fused silica and calcium fluoride, the two primary transmissive optical materials used by this industry.
© (1999) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Theodore C. Oakberg "Relative variation of stress-optic coefficient with wavelength in fused silica and calcium fluoride", Proc. SPIE 3754, Polarization: Measurement, Analysis, and Remote Sensing II, (25 October 1999); https://doi.org/10.1117/12.366332
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Cited by 6 scholarly publications and 1 patent.
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KEYWORDS
Calcium

Silica

Optical components

Birefringence

Photoelastic modulators

Calibration

Light sources

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