Paper
23 November 1999 Novel condenser for EUV lithography ring-field projection optics
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Abstract
A condenser for a ring-field extreme ultra-violet (EUV) projection lithography camera is presented. The condenser consists of a gently undulating mirror, that we refer to as a ripple plate, and which is illuminated by a collimated beam at grazing incidence. The light is incident along the ripples rather than across them, so that the incident beam is reflected onto a cone and subsequently focused onto the arc of the ring field. A quasi-stationary illumination is achieved, since any one field point receives light from points on the ripples, which are distributed throughout the condenser pupil. The design concept can easily be applied to illuminate projection cameras with various ring-field and numerical aperture specifications. Ray-tracing results are presented of a condenser for a 0.25 NA EUV projection camera.
© (1999) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Henry N. Chapman and Keith A. Nugent "Novel condenser for EUV lithography ring-field projection optics", Proc. SPIE 3767, EUV, X-Ray, and Neutron Optics and Sources, (23 November 1999); https://doi.org/10.1117/12.371121
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Cited by 7 scholarly publications.
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KEYWORDS
Mirrors

Cameras

Photomasks

Extreme ultraviolet

Projection systems

Reflection

Solids

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