Paper
23 November 1999 Progress in the development of three-aspherical mirror optics for EUVL
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Abstract
A three-aspherical mirror system for extreme ultraviolet lithography (EUVL) has been developed. The mirrors were fabricated using a computer-controlled optical surfacing (CCOS) process and a phase-shift interferometer. The figure error of the mirrors is 0.58 nm. To achieve a high reflectivity in the clear aperture, Mo/Si multilayer films with an optimized d-spacing were successfully deposited on the mirrors. These results show that we have nearly achieved the target specifications for EUVL mirrors.
© (1999) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Hiroo Kinoshita, Takeo Watanabe, Daniel J. Bajuk, Jay P. Daniel, Yachiyo Kimpara, Michael D. Kriese, and Yuriy Ya. Platonov "Progress in the development of three-aspherical mirror optics for EUVL", Proc. SPIE 3767, EUV, X-Ray, and Neutron Optics and Sources, (23 November 1999); https://doi.org/10.1117/12.371114
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Cited by 3 scholarly publications.
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KEYWORDS
Mirrors

Extreme ultraviolet lithography

Multilayers

Reflectivity

Coating

Surface finishing

Polishing

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