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25 October 1999 Differential intensity detection of surface defect scattering
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A continuous reduction of design rule in the semiconductor industry requires more than the present state-of-the-art laser surface scanners can achieve. In this paper, a description is given of the proposed methodology which possibly enhance the sensitivity in the detection of surface defects and particles. In the methodology, concentric two beams, long-focused and short focused beams, are incident on the surface. The scattered signal of each beam is detected alternatively, and subtracted. While the haze (mocroroughness signal) is only slightly changed, the defect signal change considerably. The present scattering formula has been modified for the theoretical consideration, and the scattered signal in the incidence plane has been numerically calculated with the appropriate parameter values. The results are presented and more discussions about the advantages of the method are described.
© (1999) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Byong Chon Park, Yun Woo Lee, and Beomhoan O "Differential intensity detection of surface defect scattering", Proc. SPIE 3784, Rough Surface Scattering and Contamination, (25 October 1999);

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