Carbon fiber composite photomask stage component

Brian E. Catanzaro; Jack E. Dyer; David Trost

doi:10.1117/12.363797

28 September 1999 Carbon fiber composite photomask stage component

Brian E. Catanzaro, Jack E. Dyer, David Trost

Proceedings Volume 3786, Optomechanical Engineering and Vibration Control; (1999) https://doi.org/10.1117/12.363797
Event: SPIE's International Symposium on Optical Science, Engineering, and Instrumentation, 1999, Denver, CO, United States

Abstract

The semiconductor industry utilizes complex patterning tools to achieve the patterning of fine features. These tools require stiff, lightweight, dimensionally stable components in order to reliably pattern photomasks and wafers. Traditionally, these tools have used metals, ceramics, and low expansion glasses. However, a new class of materials, high performance composites, have demonstrated promise for replacing these materials. This paper discusses the design, manufacturing, and test of a carbon fiber composite stage component of an electron beam lithography tool.

Citation Download Citation

Brian E. Catanzaro, Jack E. Dyer, and David Trost "Carbon fiber composite photomask stage component", Proc. SPIE 3786, Optomechanical Engineering and Vibration Control, (28 September 1999); https://doi.org/10.1117/12.363797

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