Exposure schedule for multiplexing holograms in photopolymer

Shiuan-Huei Lin; Ken Yuh Hsu; Wei-Zheng Chen; Wha-Tzong Whang

doi:10.1117/12.363923

20 September 1999 Exposure schedule for multiplexing holograms in photopolymer

Shiuan-Huei Lin, Ken Yuh Hsu, Wei-Zheng Chen, Wha-Tzong Whang

Proceedings Volume 3801, Photorefractive Fiber and Crystal Devices: Materials, Optical Properties, and Applications V; (1999) https://doi.org/10.1117/12.363923
Event: SPIE's International Symposium on Optical Science, Engineering, and Instrumentation, 1999, Denver, CO, United States

Abstract

We present dynamics of the grating formation process in phenanthrenequinone- (PQ-) doped poly(methyl methacrylate) (PMMA) photo-polymer. The exposure schedule for multiplexing holograms to achieve equal-strength storage in a single location is described. The analysis method is valid for any saturated media, thus the results can be applied to other photo-polymer materials with similar kinetics.

Citation Download Citation

Shiuan-Huei Lin, Ken Yuh Hsu, Wei-Zheng Chen, and Wha-Tzong Whang "Exposure schedule for multiplexing holograms in photopolymer", Proc. SPIE 3801, Photorefractive Fiber and Crystal Devices: Materials, Optical Properties, and Applications V, (20 September 1999); https://doi.org/10.1117/12.363923

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