Translator Disclaimer
Paper
20 September 1999 Exposure schedule for multiplexing holograms in photopolymer
Author Affiliations +
Abstract
We present dynamics of the grating formation process in phenanthrenequinone- (PQ-) doped poly(methyl methacrylate) (PMMA) photo-polymer. The exposure schedule for multiplexing holograms to achieve equal-strength storage in a single location is described. The analysis method is valid for any saturated media, thus the results can be applied to other photo-polymer materials with similar kinetics.
© (1999) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Shiuan-Huei Lin, Ken Yuh Hsu, Wei-Zheng Chen, and Wha-Tzong Whang "Exposure schedule for multiplexing holograms in photopolymer", Proc. SPIE 3801, Photorefractive Fiber and Crystal Devices: Materials, Optical Properties, and Applications V, (20 September 1999); https://doi.org/10.1117/12.363923
PROCEEDINGS
7 PAGES


SHARE
Advertisement
Advertisement
Back to Top