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20 September 1999 Pulsed laser ablation mechanisms of thin metal films
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Proceedings Volume 3822, Computer-Controlled Microshaping; (1999)
Event: Industrial Lasers and Inspection (EUROPTO Series), 1999, Munich, Germany
The ablation of thin films by single laser pulse is a well known technique with widespread industrial applications. Ablation occurs in a well defined power density region if a supported thin film is illuminated by a single laser pulse. In the literature there are a number of theoretical description of ablation, but a very few based on in-situ experiments. In our study we have directly visualized the ablation processes with fast photography based on application of dye laser probe pulses. The ablation of chromium and tungsten layers supported onto glass substrates with pulses of ArF excimer laser was investigated. The ablated area was illuminated by a delayed short pulse of a fluorescein dye laser or a Rhodamine6G dye laser. Snapshots of initial phase of ablation and the forthcoming material transport were recorded by an optical system and a video camera. Blowing-off mechanisms and thermo-mechanical mechanisms are considered to take place during ablation. Pressures formed during laser ablation were calculated and compared with experimental data. It was found that thermo- desorption of gas adsorbed on to the substrate surface, substrate materials evaporation and film exfoliation by its longitudinal thermal enlargement may be acting during laser ablation of thin films.
© (1999) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Zsolt Toth, Bela Hopp, Tamas Szoerenyi, Zsolt Bor, Elena A. Shakhno, and Vadim P. Veiko "Pulsed laser ablation mechanisms of thin metal films", Proc. SPIE 3822, Computer-Controlled Microshaping, (20 September 1999);

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