Paper
9 August 1983 Laser Microchemistry For Direct Writing Of Microstructures
R. M. Osgood Jr., D. J. Ehrlich, T. F. Deutsch, D. J. Silversmith, A. Sanchez
Author Affiliations +
Proceedings Volume 0385, Laser Processing of Semiconductor Devices; (1983) https://doi.org/10.1117/12.934963
Event: 1983 Los Angeles Technical Symposium, 1983, Los Angeles, United States
Abstract
Microscopic laser-initiated chemical reactions can be used to write micrometer-scale features on materials of interest for solid-state electronics. In this paper, we describe the nature of direct-write-type fabrication and summarize the laser techniques which have been developed.
© (1983) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
R. M. Osgood Jr., D. J. Ehrlich, T. F. Deutsch, D. J. Silversmith, and A. Sanchez "Laser Microchemistry For Direct Writing Of Microstructures", Proc. SPIE 0385, Laser Processing of Semiconductor Devices, (9 August 1983); https://doi.org/10.1117/12.934963
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Cited by 2 scholarly publications.
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KEYWORDS
Etching

Silicon

Semiconductor lasers

Chemical species

Doping

Semiconducting wafers

Ultraviolet radiation

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