Translator Disclaimer
30 December 1999 1999 mask industry quality assessment
Author Affiliations +
This paper will summarize the results of the seventh annual mask industry assessment survey. This year there were 12 respondents. The specific responses from the participants have been kept confidential by having the participants send their responses to Arthur Anderson & Company prior to data evaluation. This year we will report the following information: total shipments, total customer returns, mask survival rate, delivery performance, average throughput time and safety records. The data reported will be for the period of 3Q98 through 2Q98. Additionally, we will present any trends that may be apparent in the data. This year's participants are Align-Rite, Dai Nippon Printing, IBM Essex Junction, Photronics/Toppan Texas, Compugraphics, DuPont Photomasks, Northrup-Grumman, Infineon, Taiwan Mask Corporation (TMC), Taiwan Semiconductor Manufacturing Corporation (TSMC) and Innova. In order to maintain some consistency, the format that has been used from past years will be maintained when possible.
© (1999) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Brian J. Grenon "1999 mask industry quality assessment", Proc. SPIE 3873, 19th Annual Symposium on Photomask Technology, (30 December 1999);


1996 mask industry quality assessment
Proceedings of SPIE (December 27 1996)
Improved yield with SMIF implementation on ALTA systems
Proceedings of SPIE (March 11 2002)
1997 mask industry quality assessment
Proceedings of SPIE (February 12 1997)
Sizing the next generation of optical photomasks
Proceedings of SPIE (July 03 1995)
Printability of backside reticle defects
Proceedings of SPIE (September 01 1998)
New look at incoming pellicle inspection
Proceedings of SPIE (January 01 1992)

Back to Top