Absorbing assist pattern technique (A2PT) for effective sidelobe control for attenuated phase-shifting masks in optical projection lithography

Rainer Pforr; Fritz Gans; Juergen Knobloch; Joerg Thiele

doi:10.1117/12.373289

30 December 1999 Absorbing assist pattern technique (A²PT) for effective sidelobe control for attenuated phase-shifting masks in optical projection lithography

Rainer Pforr, Fritz Gans, Juergen Knobloch, Joerg Thiele

Author Affiliations +

Proceedings Volume 3873, 19th Annual Symposium on Photomask Technology; (1999) https://doi.org/10.1117/12.373289
Event: Photomask Technology and Management, 1999, Monterey, CA, United States

Abstract

A novel technique of sidelobe suppression based on absorbing assist pattern is introduced. Chrome shields are placed exactly at the position, where sidelobes appear. The effectiveness of this technique for sidelobe control is demonstrated by simulation and experimental results. The resulting process window enlargement for 180 nm contacts is investigated. Corresponding mask making issues are discussed.

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Rainer Pforr, Fritz Gans, Juergen Knobloch, and Joerg Thiele "Absorbing assist pattern technique (A²PT) for effective sidelobe control for attenuated phase-shifting masks in optical projection lithography", Proc. SPIE 3873, 19th Annual Symposium on Photomask Technology, (30 December 1999); https://doi.org/10.1117/12.373289

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