MEEF in theory and practice

Franklin M. Schellenberg; Chris A. Mack

doi:10.1117/12.373313

30 December 1999 MEEF in theory and practice

Proceedings Volume 3873, 19th Annual Symposium on Photomask Technology; (1999) https://doi.org/10.1117/12.373313
Event: Photomask Technology and Management, 1999, Monterey, CA, United States

Abstract

The Mask Error Enhancement Function (MEEF) serves to amplify reticle errors. This can lead to proximity effects and bias problems that are much larger than would be expected from the normal reduction factor of the imaging system. The economic impact on reticle specifications can be severe. This paper examines the theoretical description of the MEEF for dark features: isolated lines, isolated posts, and dense 1:1 line/space features. MEEF for dense features is found in general to be smaller than 1 over a wide range, while MEEF for isolated features is always greater than 1. This 'MEEF Gap' between isolated and dense features may help to explain the sensitivity of OPC to isolated and dense bias.

Citation Download Citation

Franklin M. Schellenberg and Chris A. Mack "MEEF in theory and practice", Proc. SPIE 3873, 19th Annual Symposium on Photomask Technology, (30 December 1999); https://doi.org/10.1117/12.373313

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