New silica glass for 157-nm lithography

Yoshiaki Ikuta; Shinya Kikugawa; T. Kawahara; H. Mishiro; Noriaki Shimodaira; H. Arishima; Shuhei Yoshizawa

doi:10.1117/12.373303

Translator Disclaimer

30 December 1999 New silica glass for 157-nm lithography

Yoshiaki Ikuta, Shinya Kikugawa, T. Kawahara, H. Mishiro, Noriaki Shimodaira, H. Arishima, Shuhei Yoshizawa

Author Affiliations +

Proceedings Volume 3873, 19th Annual Symposium on Photomask Technology; (1999) https://doi.org/10.1117/12.373303
Event: Photomask Technology and Management, 1999, Monterey, CA, United States

Abstract

Projection photolithography at 157 nm is now under research as a possible extension of current 248 nm and planned 193 nm technologies. Although the conventional silica glass used for 248 nm and 193 nm lithography cannot be applied for 157 nm lithography because of its low transmittance, we have already developed the modified fused silica glass 'AQF' for 157 nm lithography. In this paper, we report on the fabrication of 'AQF' 6 inch photomask substrate. 157 nm transmission and its uniformity is better than 75 plus or minus 3%, and flatness is less than 0.5 micrometer. Defects over 0.4 micrometer in size are free. The physical and mechanical properties are also shown to be similar with our conventional silica glass 'AQ.'

Citation Download Citation

Yoshiaki Ikuta, Shinya Kikugawa, T. Kawahara, H. Mishiro, Noriaki Shimodaira, H. Arishima, and Shuhei Yoshizawa "New silica glass for 157-nm lithography", Proc. SPIE 3873, 19th Annual Symposium on Photomask Technology, (30 December 1999); https://doi.org/10.1117/12.373303

ACCESS THE FULL ARTICLE