System architecture choices for an advanced mask writer (100 to 130 nm)

Varoujan Chakarian; Frederick Raymond III; Charles A. Sauer; Sergey V. Babin; Robert Innes; Allan L. Sagle; Ulrich Hofmann; Bassam Shamoun; David Trost; Abe Ghanbari; Frank E. Abboud

doi:10.1117/12.373318

30 December 1999 System architecture choices for an advanced mask writer (100 to 130 nm)

Varoujan Chakarian, Frederick Raymond III, Charles A. Sauer, Sergey V. Babin, Robert Innes, Allan L. Sagle, Ulrich Hofmann, Bassam Shamoun, David Trost, Abe Ghanbari, Frank E. Abboud

Author Affiliations +

Proceedings Volume 3873, 19th Annual Symposium on Photomask Technology; (1999) https://doi.org/10.1117/12.373318
Event: Photomask Technology and Management, 1999, Monterey, CA, United States

Abstract

System architecture choices for an advanced mask writer (100 - 130 nm) have been evaluated. To compare and contrast variably shaped beam vector architecture with raster-based architecture, factors such as beam accelerating voltage and its effects on lithographic performance and system throughput for complex patterns have been studied. The results indicate that while both architectures have strengths and weaknesses, in the final analysis, raster-based systems offer the best combination of benefits to the user in terms of versatility and overall system throughput. Furthermore, other system requirements needed to support the challenges of the next generation mask writers are discussed. An architecture that includes a 50 kV raster graybeam (RGB), based architecture, a new writing strategy, a new stage system, an advanced environmental/thermal control management system, an automated material handling system, and a new resist and process is proposed.

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Varoujan Chakarian, Frederick Raymond III, Charles A. Sauer, Sergey V. Babin, Robert Innes, Allan L. Sagle, Ulrich Hofmann, Bassam Shamoun, David Trost, Abe Ghanbari, and Frank E. Abboud "System architecture choices for an advanced mask writer (100 to 130 nm)", Proc. SPIE 3873, 19th Annual Symposium on Photomask Technology, (30 December 1999); https://doi.org/10.1117/12.373318

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