SCALPEL mask blank fabrication

Thomas E. Saunders; Myrtle I. Blakey; Carlos Caminos; Gregory R. Bogart; Reginald C. Farrow; Chester S. Knurek; Avi Kornblit; James Alexander Liddle; Anthony E. Novembre; Milton L. Peabody Jr.

doi:10.1117/12.361228

30 August 1999 SCALPEL mask blank fabrication

Thomas E. Saunders, Myrtle I. Blakey, Carlos Caminos, Gregory R. Bogart, Reginald C. Farrow, Chester S. Knurek, Avi Kornblit, James Alexander Liddle, Anthony E. Novembre, Milton L. Peabody Jr.

Author Affiliations +

Proceedings Volume 3874, Micromachining and Microfabrication Process Technology V; (1999) https://doi.org/10.1117/12.361228
Event: Symposium on Micromachining and Microfabrication, 1999, Santa Clara, CA, United States

Abstract

The SCALPEL lithography system combines the advantages of high resolution and wide process latitude of electron beam lithography with the throughput of a projection system. The SCALPEL approach has the potential to meet the minimum feature size requirements of future IC generations down to 50 nm.

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Thomas E. Saunders, Myrtle I. Blakey, Carlos Caminos, Gregory R. Bogart, Reginald C. Farrow, Chester S. Knurek, Avi Kornblit, James Alexander Liddle, Anthony E. Novembre, and Milton L. Peabody Jr. "SCALPEL mask blank fabrication", Proc. SPIE 3874, Micromachining and Microfabrication Process Technology V, (30 August 1999); https://doi.org/10.1117/12.361228

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