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30 August 1999 SCALPEL mask blank fabrication
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Proceedings Volume 3874, Micromachining and Microfabrication Process Technology V; (1999) https://doi.org/10.1117/12.361228
Event: Symposium on Micromachining and Microfabrication, 1999, Santa Clara, CA, United States
Abstract
The SCALPEL lithography system combines the advantages of high resolution and wide process latitude of electron beam lithography with the throughput of a projection system. The SCALPEL approach has the potential to meet the minimum feature size requirements of future IC generations down to 50 nm.
© (1999) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Thomas E. Saunders, Myrtle I. Blakey, Carlos Caminos, Gregory R. Bogart, Reginald C. Farrow, Chester S. Knurek, Avi Kornblit, James Alexander Liddle, Anthony E. Novembre, and Milton L. Peabody Jr. "SCALPEL mask blank fabrication", Proc. SPIE 3874, Micromachining and Microfabrication Process Technology V, (30 August 1999); https://doi.org/10.1117/12.361228
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