Pixel-by-pixel aberration correction for scanned-beam micro-optical instruments

David L. Dickensheets; Paul V. Ashcraft; Phillip A. Himmer

doi:10.1117/12.361286

2 September 1999 Pixel-by-pixel aberration correction for scanned-beam micro-optical instruments

David L. Dickensheets, Paul V. Ashcraft, Phillip A. Himmer

Proceedings Volume 3878, Miniaturized Systems with Micro-Optics and MEMS; (1999) https://doi.org/10.1117/12.361286
Event: Symposium on Micromachining and Microfabrication, 1999, Santa Clara, CA, United States

Abstract

Variable aberration compensation elements designed to correct the primary aberrations, and capable of sufficient speed for on-the-fly correction, can significantly extend the diffraction-limited field of view of scanned-beam instruments using practical microlens systems. In this paper we review the relevant aberration theory and discuss the requirements for compensation elements as well as appropriate architectures for correction of a scanned-beam instrument. We report correction of astigmatism and field curvature in an F/20 optical system using deformable polysilicon reflective membranes. Devices were successfully demonstrated that compensated more than 1.5 waves of defocus and more than 1 wave of astigmatism with less than 1/10 wave of spherical aberration, and with a bandwidth in excess of 20 kHz, which is suitable for high speed beam scanning applications such as video-rate imaging.

Citation Download Citation

David L. Dickensheets, Paul V. Ashcraft, and Phillip A. Himmer "Pixel-by-pixel aberration correction for scanned-beam micro-optical instruments", Proc. SPIE 3878, Miniaturized Systems with Micro-Optics and MEMS, (2 September 1999); https://doi.org/10.1117/12.361286

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