Translator Disclaimer
27 August 1999 SEM-based automatic defect classification (ADC)
Author Affiliations +
Automatic defect classification (ADC) on the optical defect detection and review tools have found increasing acceptance in the cleanroom for defect reduction during all phases of yield learning (process R&D, yield ramp and mature production). However at 180 nm technology node, the optical tools are unable to classify the smaller defects of interest. SEM based ADC tools provide this capability through high resolution imaging and classification. This paper will provide an overview of past and future yield learning trends and challenges, role of ADC in the yield learning process and a detailed review of the SEM based ADC tool evaluation project conducted at SEMATECH during 1997/1998 which yielded the following beta results at a SEMATECH member company fab.
© (1999) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Fred Lakhani and Wanda Tomlinson "SEM-based automatic defect classification (ADC)", Proc. SPIE 3884, In-Line Methods and Monitors for Process and Yield Improvement, (27 August 1999);


A trainable die to database for fast e Beam inspection...
Proceedings of SPIE (March 20 2020)
Copy result exactly using EB-Scope technology
Proceedings of SPIE (July 15 2003)
TiW particle control for VLSI manufacturing
Proceedings of SPIE (September 22 1995)
The first on site evaluation of a new filter optimized...
Proceedings of SPIE (December 04 2008)
Integrated approach to yield enhancement
Proceedings of SPIE (September 14 1994)

Back to Top