Paper
1 October 1999 Process technologies for high-resolution infrared detectors based on LiTaO3
Author Affiliations +
Proceedings Volume 3892, Device and Process Technologies for MEMS and Microelectronics; (1999) https://doi.org/10.1117/12.364489
Event: Asia Pacific Symposium on Microelectronics and MEMS, 1999, Gold Coast, Australia
Abstract
IR system designers increasingly demand pyroelectric detectors demonstrating on the one hand a geometry and number of responsive elements, which are highly user- specific, and a very high signal-to-noise ration on the other. This paper describes the principal design of high- resolution single-element detectors and arrays based on the pyroelectric material lithium tentalate together with subtechnologies for manufacturing. It is shown that the production of self-supporting responsive elements with a thickness smaller than 5 micrometers will be feasible by applying a combined chemical and mechanical polishing together with ion beam etching. In the attempt to increase the absorption coefficient of these elements special silver black coatings are deposited, which result in an absorption coefficient (alpha) >= 0.92 in the wave range pitches of 50 micrometers were reached for ultrasonic bonding processes. Selected detector parameters are used to prove the potential advancement of detector characteristics, which will be feasible by applying these technologies.
© (1999) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Volkmar Norkus, Gerald Gerlach, and Guenter Hofmann "Process technologies for high-resolution infrared detectors based on LiTaO3", Proc. SPIE 3892, Device and Process Technologies for MEMS and Microelectronics, (1 October 1999); https://doi.org/10.1117/12.364489
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Cited by 15 scholarly publications.
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KEYWORDS
Sensors

Chemical elements

Ion beams

Etching

Electrodes

Metals

Polishing

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