Paper
12 November 1999 Simple theory of steam oxidation of AlAs
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Proceedings Volume 3896, Design, Fabrication, and Characterization of Photonic Devices; (1999) https://doi.org/10.1117/12.370359
Event: International Symposium on Photonics and Applications, 1999, Singapore, Singapore
Abstract
Kinetics of AlAs steam oxidation process is investigated theoretically in cylindrically symmetric mesa structures. Under the assumption of a steady-state process, compact analytical formulae are obtained for time evolution of the oxidation front and for the oxidation rate. Values of main oxidation process parameters are extracted from existing experimental data for T = 350 °C and the layer thickness d = 250 nm. The oxidation rate is found to first decrease from its initial value of B/A and remain almost constant for a large range of intermediate sizes of unoxidized region. When the unoxidized region becomes very small, a rapid increase in this rate up to the value of B/[A(1-β)] is predicted. This renders the process control of fabricating miniature oxide apertures with diameters < 2 μm extremely difficult. Comparison with 1D model of oxidation process in cartesian geometry reveals significant differences in time evolution of the oxidation front. Understanding these differences is important for achieving a good control of the oxidation process in cylindrical structures.
© (1999) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Marek Osinski, Tengiz Svimonishvili, Gennady A. Smolyakov, Vladimir A. Smagley, Pawel Mackowiak, and Wlodzimierz Nakwaski "Simple theory of steam oxidation of AlAs", Proc. SPIE 3896, Design, Fabrication, and Characterization of Photonic Devices, (12 November 1999); https://doi.org/10.1117/12.370359
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KEYWORDS
Oxidation

Oxides

Process control

Process modeling

Vertical cavity surface emitting lasers

Particles

Diffusion

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