Nonlinear absorption phenomena in oxide coatings for 193 nm

Oliver Apel; Klaus R. Mann; Joerg Heber; Roland Thielsch

doi:10.1117/12.379311

3 March 2000 Nonlinear absorption phenomena in oxide coatings for 193 nm

Oliver Apel, Klaus R. Mann, Joerg Heber, Roland Thielsch

Author Affiliations +

Proceedings Volume 3902, Laser-Induced Damage in Optical Materials: 1999; (2000) https://doi.org/10.1117/12.379311
Event: Laser-Induced Damage in Optical Materials: 1999, 1999, Boulder, CO, United States

Abstract

New absorption measurements for aluminum oxide optical coatings at 193nm are presented. Apart from the strong linear absorption at this wavelength the data indicate a nonlinear absorption within the thin dielectric layer. By varying the laser thickness, the intrinsic contribution of the layer material to the overall absorption was separated from the contribution of the substrate and the interface. In addition, the conditioning behavior of the coatings was examined. A strong long term conditioning in the linear absorption was found for Al₂O₃ containing systems. Comparing the absorption and conditioning behavior of the single layers and a high-reflective system, we can show that the absorption properties of the HR-system are determined by its Al₂O₃ layers.

Citation Download Citation

Oliver Apel, Klaus R. Mann, Joerg Heber, and Roland Thielsch "Nonlinear absorption phenomena in oxide coatings for 193 nm", Proc. SPIE 3902, Laser-Induced Damage in Optical Materials: 1999, (3 March 2000); https://doi.org/10.1117/12.379311

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