Scatter and absortion losses from DUV optics: a comparative study

Oliver Apel; Klaus R. Mann

doi:10.1117/12.379312

3 March 2000 Scatter and absortion losses from DUV optics: a comparative study

Oliver Apel, Klaus R. Mann

Proceedings Volume 3902, Laser-Induced Damage in Optical Materials: 1999; (2000) https://doi.org/10.1117/12.379312
Event: Laser-Induced Damage in Optical Materials: 1999, 1999, Boulder, CO, United States

Abstract

DUV optical components are examined with respect to their optical losses at 193nm. Scattering and calorimetric absorption measurements were performed. The used calorimetric measurement setup allows absolute absorptance measurement with ppm resolution. By varying the energy density on the sample, linear as well as nonlinear absorptance can be determined. The total-scattering measurement setup allows the determination of both forward and backward scattering independently. We examined bare fused silica substrates, single layer coatings and thin film stacks. The obtained data give a detailed overview over the strength and the origins of the losses due to the different mechanisms for these optical components.

Citation Download Citation

Oliver Apel and Klaus R. Mann "Scatter and absortion losses from DUV optics: a comparative study", Proc. SPIE 3902, Laser-Induced Damage in Optical Materials: 1999, (3 March 2000); https://doi.org/10.1117/12.379312

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