Thickness dependence of damage thresholds for 193-nm dielectric mirrors by predamage sensitive photothermal technique

Holger Blaschke; Winfried Arens; Detlev Ristau; Sven Martin; Bincheng Li; Eberhard Welsch

doi:10.1117/12.379306

3 March 2000 Thickness dependence of damage thresholds for 193-nm dielectric mirrors by predamage sensitive photothermal technique

Holger Blaschke, Winfried Arens, Detlev Ristau, Sven Martin, Bincheng Li, Eberhard Welsch

Author Affiliations +

Proceedings Volume 3902, Laser-Induced Damage in Optical Materials: 1999; (2000) https://doi.org/10.1117/12.379306
Event: Laser-Induced Damage in Optical Materials: 1999, 1999, Boulder, CO, United States

Abstract

HR layer stacks with increasing number of HL pairs of fluoride material deposited on different substrates have been successfully investigated with respect to the laser radiation damage threshold at 248 nm and 193 nm. In this paper the investigation has been extended on resonant as well as non-resonant oxide coatings deposited by ion beam sputtering (IBS). Compared to conventional evaporation and plasma ion assisted evaporation technique, IBS coatings exhibit a higher packing density, thus preventing water to enter the film which woudl degrade the quality of the coatings. In contrast, the thermal stress is increased in IBS layer stacks. The measurements were carried out by use of the pulsed thermal lens technique enabling us to measure the advent of otpical breakdown induced by laser fluences in the subdamage range.

Citation Download Citation

Holger Blaschke, Winfried Arens, Detlev Ristau, Sven Martin, Bincheng Li, and Eberhard Welsch "Thickness dependence of damage thresholds for 193-nm dielectric mirrors by predamage sensitive photothermal technique", Proc. SPIE 3902, Laser-Induced Damage in Optical Materials: 1999, (3 March 2000); https://doi.org/10.1117/12.379306

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