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10 March 2000 Improved simulated annealing algorithm for optimization of symmetrical diffractive elements
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Proceedings Volume 3951, Diffractive/Holographic Technologies and Spatial Light Modulators VII; (2000) https://doi.org/10.1117/12.379359
Event: Symposium on Integrated Optoelectronics, 2000, San Jose, CA, United States
Abstract
We present a modified simulated annealing algorithm for the design of diffractive optical elements whose basic cell is constrained by a symmetry similar to that of the reconstruction field. Compared with the conventional SA algorithm, our approach permits better designs with reduced computational efforts.
© (2000) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Luis A. Gonzalez and Victor M. Arrizon "Improved simulated annealing algorithm for optimization of symmetrical diffractive elements", Proc. SPIE 3951, Diffractive/Holographic Technologies and Spatial Light Modulators VII, (10 March 2000); https://doi.org/10.1117/12.379359
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