Paper
15 May 2000 Total dose effects on CMOS active pixel sensors
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Abstract
Co60 irradiations have been carried out on test structures for the development of CMOS Active Pixel Sensors that can be used in a radiation environment. The basic mechanisms that may cause failure are presented. Ionization induced damage effects such as field leakage currents and dark current increase are discussed in detail. Two different approaches to overcome these problems are considered and their advantages and disadvantages are compared. Total dose results are presented on a pixel that can tolerate more than 200 kGy(Si) (20 Mrad(Si)) from a Co60 source.
© (2000) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Jan Bogaert and Bart Dierickx "Total dose effects on CMOS active pixel sensors", Proc. SPIE 3965, Sensors and Camera Systems for Scientific, Industrial, and Digital Photography Applications, (15 May 2000); https://doi.org/10.1117/12.385432
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Cited by 35 scholarly publications.
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KEYWORDS
Transistors

Annealing

Photodiodes

Interfaces

Oxides

Microelectronics

CMOS sensors

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