Advanced CD error detection with CD SEM disposition

Darren Taylor; Barry Rockwell; Aihua Dong; Anthony Vacca; Waiman Ng; Geoffrey T. Anderson; William B. Howard

doi:10.1117/12.377115

Translator Disclaimer

3 February 2000 Advanced CD error detection with CD SEM disposition

Darren Taylor, Barry Rockwell, Aihua Dong, Anthony Vacca, Waiman Ng, Geoffrey T. Anderson, William B. Howard

Author Affiliations +

Proceedings Volume 3996, 16th European Conference on Mask Technology for Integrated Circuits and Microcomponents; (2000) https://doi.org/10.1117/12.377115
Event: 16th European Conference on Mask Technology for Integrated Circuits and Microcomponents, 1999, Munich, Germany

Abstract

In this study, we used production reticles and a new programmed defect test mask to characterize the sensitivity and false defect performance of several algorithms (ALM100, ALM200 and ALM300). ALM300's sensitivity spec is 60 nm. The inspection results were transferred to a CD SEM for analysis. SEM measurements were taken to validate the sensitivity of the algorithm and to quantify the calibration accuracy of the review tools of the inspection system.

Citation Download Citation

Darren Taylor, Barry Rockwell, Aihua Dong, Anthony Vacca, Waiman Ng, Geoffrey T. Anderson, and William B. Howard "Advanced CD error detection with CD SEM disposition", Proc. SPIE 3996, 16th European Conference on Mask Technology for Integrated Circuits and Microcomponents, (3 February 2000); https://doi.org/10.1117/12.377115

ACCESS THE FULL ARTICLE