Improvements to mask inspectability by use of pattern proximity correction

Anja Rosenbusch; Vicky Bailey; Yair Eran; Reuven Falah; Neil J. Holmes; Andrew C. Hourd; Andrew McArthur; Wolfgang Staud

doi:10.1117/12.377109

3 February 2000 Improvements to mask inspectability by use of pattern proximity correction

Anja Rosenbusch, Vicky Bailey, Yair Eran, Reuven Falah, Neil J. Holmes, Andrew C. Hourd, Andrew McArthur, Wolfgang Staud

Author Affiliations +

Proceedings Volume 3996, 16th European Conference on Mask Technology for Integrated Circuits and Microcomponents; (2000) https://doi.org/10.1117/12.377109
Event: 16th European Conference on Mask Technology for Integrated Circuits and Microcomponents, 1999, Munich, Germany

Abstract

Inspection is one of the major challenges in mask making, as it is one of its most performance crucial steps in the entire mask making process. Especially contact patterns show difficulties in die-to-database inspection as the CAD data asks for square corners. The paper presents the impact of Laser Proximity Correction (LPC) on the inspectability of contact and line patterns. LPC is a mask enhancement technique improving image quality and CD linearity for laser pattern generators. The use of the linewidth bias monitor tool in order to characterize CD uniformity over the entire plate is demonstrated.

Citation Download Citation

Anja Rosenbusch, Vicky Bailey, Yair Eran, Reuven Falah, Neil J. Holmes, Andrew C. Hourd, Andrew McArthur, and Wolfgang Staud "Improvements to mask inspectability by use of pattern proximity correction", Proc. SPIE 3996, 16th European Conference on Mask Technology for Integrated Circuits and Microcomponents, (3 February 2000); https://doi.org/10.1117/12.377109

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