Innovative approach for concurrent CD-uniformity monitoring and reticle inspection

Amikam Sade; Juergen Fandrich; Shirley Hemar; Yair Eran

doi:10.1117/12.377108

3 February 2000 Innovative approach for concurrent CD-uniformity monitoring and reticle inspection

Amikam Sade, Juergen Fandrich, Shirley Hemar, Yair Eran

Proceedings Volume 3996, 16th European Conference on Mask Technology for Integrated Circuits and Microcomponents; (2000) https://doi.org/10.1117/12.377108
Event: 16th European Conference on Mask Technology for Integrated Circuits and Microcomponents, 1999, Munich, Germany

Abstract

In this paper a new approach of concurrent CD-uniformity monitoring is presented. This is achieved by using the Linewidth Bias Monitoring (LBM) tool, which utilizes data collected during the reticle inspection to concurrently generate real-time line width monitoring with superb precision without affecting inspection time or results. The capabilities of the LBM are presented by a specially designed test-plate, establishing the tool precision and repeatability. Analysis of case studies based on various production plates demonstrates the contribution to process control and mask fidelity.

Citation Download Citation

Amikam Sade, Juergen Fandrich, Shirley Hemar, and Yair Eran "Innovative approach for concurrent CD-uniformity monitoring and reticle inspection", Proc. SPIE 3996, 16th European Conference on Mask Technology for Integrated Circuits and Microcomponents, (3 February 2000); https://doi.org/10.1117/12.377108

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