Laser cleaning of silicon membrane stencil masks

Werner Zapka; R. Lilischkis; Hans P. Zappe

doi:10.1117/12.377095

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3 February 2000 Laser cleaning of silicon membrane stencil masks

Werner Zapka, R. Lilischkis, Hans P. Zappe

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Proceedings Volume 3996, 16th European Conference on Mask Technology for Integrated Circuits and Microcomponents; (2000) https://doi.org/10.1117/12.377095
Event: 16th European Conference on Mask Technology for Integrated Circuits and Microcomponents, 1999, Munich, Germany

Abstract

Liquid film enhanced LF laser cleaning with XeCl- and KrF- excimer lasers was demonstrated to remove sub-micrometer SiO₂, and Al₂O₃ particles from silicon wafer surfaces, and from silicon membrane stencil masks, the threshold fluences for LF laser cleaning were determined. The importance of controlled liquid film deposition for efficient cleaning is discussed.

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Werner Zapka, R. Lilischkis, and Hans P. Zappe "Laser cleaning of silicon membrane stencil masks", Proc. SPIE 3996, 16th European Conference on Mask Technology for Integrated Circuits and Microcomponents, (3 February 2000); https://doi.org/10.1117/12.377095

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