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3 February 2000 Laser cleaning of silicon membrane stencil masks
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Proceedings Volume 3996, 16th European Conference on Mask Technology for Integrated Circuits and Microcomponents; (2000) https://doi.org/10.1117/12.377095
Event: 16th European Conference on Mask Technology for Integrated Circuits and Microcomponents, 1999, Munich, Germany
Abstract
Liquid film enhanced LF laser cleaning with XeCl- and KrF- excimer lasers was demonstrated to remove sub-micrometer SiO2, and Al2O3 particles from silicon wafer surfaces, and from silicon membrane stencil masks, the threshold fluences for LF laser cleaning were determined. The importance of controlled liquid film deposition for efficient cleaning is discussed.
© (2000) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Werner Zapka, R. Lilischkis, and Hans P. Zappe "Laser cleaning of silicon membrane stencil masks", Proc. SPIE 3996, 16th European Conference on Mask Technology for Integrated Circuits and Microcomponents, (3 February 2000); https://doi.org/10.1117/12.377095
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