Design of EUVL camera with large numerical aperture

Yanqiu Li; Takeo Watanabe; Hiroo Kinoshita

doi:10.1117/12.390115

21 July 2000 Design of EUVL camera with large numerical aperture

Yanqiu Li, Takeo Watanabe, Hiroo Kinoshita

Proceedings Volume 3997, Emerging Lithographic Technologies IV; (2000) https://doi.org/10.1117/12.390115
Event: Microlithography 2000, 2000, Santa Clara, CA, United States

Abstract

A design of four-mirror imaging optics is presented for the wavelength of 13.5 nm. The numerical aperture (NA) is 0.15. The reduction ratio is 5:1. The exposure area on wafer is 0.5 mm (width) X 25 mm (chord length). The designed resolution is 50 nm with MTF approximately equals 60%. The distortion is less than 0.01% and the astigmatism is near zero at the designed ring field.

Citation Download Citation

Yanqiu Li, Takeo Watanabe, and Hiroo Kinoshita "Design of EUVL camera with large numerical aperture", Proc. SPIE 3997, Emerging Lithographic Technologies IV, (21 July 2000); https://doi.org/10.1117/12.390115

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