Nikon stepper process program parameter optimization and overlay improvement

LuJia Chen; Lim Hui Kow; Wenzhan Zhou; Graham C. Ruck; Li Zheng

doi:10.1117/12.390101

21 July 2000 Nikon stepper process program parameter optimization and overlay improvement

LuJia Chen, Lim Hui Kow, Wenzhan Zhou, Graham C. Ruck, Li Zheng

Proceedings Volume 3997, Emerging Lithographic Technologies IV; (2000) https://doi.org/10.1117/12.390101
Event: Microlithography 2000, 2000, Santa Clara, CA, United States

Abstract

The accuracy of feature overlapping has been one of the most important challenges required in the manufacturing of advanced microelectronic devices. This paper explores the application of Nikon stepper alignment skills and overlay modeling which includes the relationship between Nikon stepper process program parameters and overlay performance. The distribution and number of experiments were carried out to check out the crucial parameters, which will affect overlay individually. In order to characterize the performance of each parameter settings, criteria excluding the alignment error caused by stepper matching and overlay error caused by KLA measurement.

Citation Download Citation

LuJia Chen, Lim Hui Kow, Wenzhan Zhou, Graham C. Ruck, and Li Zheng "Nikon stepper process program parameter optimization and overlay improvement", Proc. SPIE 3997, Emerging Lithographic Technologies IV, (21 July 2000); https://doi.org/10.1117/12.390101

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