Novel interferometer to measure the figure of ashperical mirrors as used in EUV lithography

Rene G. Klaver; Joseph J. M. Braat

doi:10.1117/12.390119

21 July 2000 Novel interferometer to measure the figure of ashperical mirrors as used in EUV lithography

Rene G. Klaver, Joseph J. M. Braat

Proceedings Volume 3997, Emerging Lithographic Technologies IV; (2000) https://doi.org/10.1117/12.390119
Event: Microlithography 2000, 2000, Santa Clara, CA, United States

Abstract

A visible light interferometer to measure the figure of aspherical mirrors, as used in extreme-ultraviolet lithography, will be presented. Except for two fiber tips to generate the reference and object wavefronts, it contains no auxiliary optics. The phase difference is measured using frequency modulation and heterodyne techniques. The figure is computed from the phase difference. We determined the specifications for the two-dimensional detector array, with which the phase difference is measured, and computed the position accuracy of the optical components. The resolution of the frequency modulation system should be 0.3 micrometer and the accuracy of the heterodyne technique should be 0.1 nm.

Citation Download Citation

Rene G. Klaver and Joseph J. M. Braat "Novel interferometer to measure the figure of ashperical mirrors as used in EUV lithography", Proc. SPIE 3997, Emerging Lithographic Technologies IV, (21 July 2000); https://doi.org/10.1117/12.390119

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